Parameterization of nona "--clip-exposure" option
Bug #1508898 reported by
Iouri Ivliev
This bug affects 1 person
Affects | Status | Importance | Assigned to | Milestone | |
---|---|---|---|---|---|
Hugin |
Fix Released
|
Undecided
|
Unassigned |
Bug Description
For now nona has hardcoded dark and bright pixel levels for "--clip-exposure" option. IMHO, it could be helpful to make these levels are modifiable by the user. The patch in the attachment adds two command line options ("--dark-level" and "--bright-level") to set dark and bright pixel levels.
Changed in hugin: | |
milestone: | none → 2016.0beta1 |
status: | Fix Committed → Fix Released |
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Thanks for the patch. But I had to rework it: ELvl(1/ 255.0f) , m_clipExpMaskOE Lvl(250/ 255.0f) vs. "0.003921568627 45098") ; static const std::string oelvlDef( "0.980392156862 745");
* strtof is only supported by C++11, but we don't enforce C++11
* strtolvl has nothing to do with ImageRemapper and should therefore moved out of this file
* The variables names m_clipExpMaskUELvl and m_clipExpMaskOELvl (and other) are completely unreadable (UEL is lower level/cutoff, OEL is upper level; what is U and what is O -> please use english words).
* The input should by checked by the calling program and not passed deep into further function and then silently ignored if there are invalid inputs. There is no feedback for the user that something is wrong.
* The default values are used in several places in several different formats:
m_clipExpMaskU
static const std::string uelvlDef(
* We have already enough options. Don't introduce 2 more options for a "minor" feature.
Committed as changeset 7d1e8251d212.